Vertical dmos-field effect transistor

ABSTRACT

A vertical diffused metal oxide semiconductor (DMOS) field-effect transistors (FET) comprises a substrate of a first conductivity type forming a drain region; an epitaxial layer of the first conductivity type on said substrate; first and second base regions of the second conductivity type within said epitaxial layer, spaced apart by a predefined distance; first and second source regions of a first conductivity type arranged in said first and second base regions, respectively, wherein said first and second base region is operable to form first and second lateral channels between said source region and said epitaxial layer; a gate structure insulated from said epitaxial layer by an insulation layer and arranged above the region between the first and second base regions and wherein the gate structure comprises first and second gate regions, each gate region only covering the first and second channel, respectively within said first and second base region.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application No.61/416,638 filed on Nov. 23, 2010, entitled “LOW CAPACITANCE VERTICALGATE-FIELD EFFECT TRANSISTOR”, which is incorporated herein in itsentirety

TECHNICAL FIELD

This application concerns a vertical DMOS-Field Effect Transistor (FET).

BACKGROUND

Power metal oxide semiconductor field-effect transistors (MOSFET) aregenerally used to handle high power levels in comparison to lateraltransistors in integrated circuits. FIG. 6 shows a typical MOSFET whichuses a vertical diffused MOSFET structure, also called double-diffusedMOSFET structure (DMOS or VDMOS).

As shown, for example, in FIG. 6, on an N+ substrate 415 there is a N−epitaxial layer formed whose thickness and doping generally determinesthe voltage rating of the device. From the top into the epitaxial layer410 there are formed N⁺ doped left and right source regions 430surrounded by P-doped region 420 which forms the P-base. The P-base mayhave an out diffusion area 425 surrounding the P-base 420. A sourcecontact 460 generally contacts both regions 430 and 420 on the surfaceof the die and is generally formed by a metal layer that connects bothleft and right source region. An insulating layer 450, typically silicondioxide or any other suitable material, insulates a polysilicon gate 440which covers a part of the P-base region 420 and out diffusion area 425.The gate 440 is connected to a gate contact 470 which is usually formedby another metal layer. The bottom side of this vertical transistor hasanother metal layer 405 forming the drain contact 480. In summary, FIG.6 shows a typical elementary cell of a MOSFET that can be very small andcomprises a common drain, a common gate and two source regions and twochannels. Other similar cells may be used in a vertical power MOS-FET. Aplurality of such cells may generally be connected in parallel to form apower MOSFET.

In the On-state, a channel is formed within the area of regions 420 and425 covered by the gate reaching from the surface into the regions 420and 425, respectively. Thus, current can flow as indicated by thehorizontal arrow. The cell structure must provide for a sufficient widthd of gate 440 to allow for this current to turn into a vertical currentflowing to the drain side as indicated by the vertical arrows.

Such structures have a relatively high gate source capacitance due tothe necessary width of the gate which is undesirable, in particular, inhigh frequency switching applications such as switched mode powersupplies.

SUMMARY

According to an embodiment, a vertical diffused metal oxidesemiconductor (DMOS) field-effect transistors (FET), with a cellstructure may comprise a substrate of a first conductivity type forminga drain region; an epitaxial layer of the first conductivity type onsaid substrate; first and second base regions of the second conductivitytype within said epitaxial layer, spaced apart by a predefined distance;first and second source regions of a first conductivity type arranged insaid first and second base regions, respectively, wherein said first andsecond base region is operable to form first and second lateral channelsbetween said source region and said epitaxial layer; a gate structureinsulated from said epitaxial layer by an insulation layer and arrangedabove the region between the first and second base regions and whereinthe gate structure comprises first and second gate regions, each gateregion only covering the first and second channel, respectively withinsaid first and second base region.

According to a further embodiment, the insulating layer may comprise agate oxide layer on top of which a thick oxide layer is deposited andpatterned. According to a further embodiment, the thick oxide layer canbe patterned to form a pedestal between said first and second sourceregions. According to a further embodiment, the vertical DMOS-FET mayfurther comprise a lightly doped area of the second conductivity typeextending from the surface into the epitaxial layer between the firstand second base regions. According to a further embodiment, the verticalDMOS-FET may further comprise a sinker extending from the surface intothe epitaxial layer between the first and second base regions. Accordingto a further embodiment, the vertical DMOS-FET may further comprise asource metal layer connecting said first and second source region andsaid first and second base region. According to a further embodiment,the vertical DMOS-FET may further comprise first and second diffusionareas of said second conductivity type surrounding said first and secondbase regions, respectively. According to a further embodiment, the gatestructure may comprise a bridging section connecting the first andsecond gate and being farther spaced apart from said epitaxial layerthan said first and second gate. According to a further embodiment, thebridging area can be arranged outside the cell structure. According to afurther embodiment, the first and second gate can be connected by wirebonding. According to a further embodiment, the vertical DMOS-FET mayfurther comprise a drain metal layer on the backside of the substrate.According to a further embodiment, the cell structure or a plurality ofcell structures can be formed in an integrated circuit device. Accordingto a further embodiment, the integrated circuit device may provide forcontrol functions for a switched mode power supply. According to afurther embodiment, the first conductivity type can be P-type and thesecond conductivity type is N-type. According to a further embodiment,the first conductivity type can be N-type and the second conductivitytype is P-type.

According to another embodiment, a method for manufacturing a cellstructure of a vertical diffused metal oxide semiconductor (DMOS)field-effect transistors (FET), may comprise: forming a cell structurecomprising first and second source regions of a first conductivity typewithin a first and second base region of a second conductivity type inan epitaxial layer of a first conductivity type arranged on a substrateof a first conductivity type, wherein the first and second base regionsare spaced apart by a predefined distance, and wherein said first andsecond base region is operable to form first and second lateral channelsbetween said source region and said epitaxial layer; forming a gateinsulating layer on top of said epitaxial layer having a pedestalbetween said first and second base region; forming first and secondgates on side walls of said pedestal covering said first and secondchannel.

According to a further embodiment of the method, the step of forming agate insulating layer may comprise: depositing a thin gate oxide layer,depositing a thick oxide layer on top the thin gate oxide layer, andetching the thick oxide layer to form said pedestal. According to afurther embodiment of the method, the method may further compriseforming a lightly doped region extending from the surface of theepitaxial layer into the epitaxial layer between said first and secondbase region. According to a further embodiment of the method, the stepof forming the first and second gate may provide for a bridging area ofa gate structure connecting the first and second gates. According to afurther embodiment of the method, the bridging area can be locatedoutside the cell structure. According to a further embodiment of themethod, the method may further comprise connecting the first and secondgates by a metal layer. According to a further embodiment of the method,the method may further comprise connecting the first and second gates bywire bonding. According to a further embodiment of the method, themethod may further comprise forming a sinker structure in the centerarea between said first and second base regions extending from thesurface of the expitaxial layer to the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a first embodiment of an improved vertical DMOS-FET.

FIG. 2 shows a second embodiment of an improved vertical DMOS-FET.

FIG. 3 shows a third embodiment of an improved vertical DMOS-FET.

FIG. 4A, 4B show an more detailed view of a gate according to variousembodiments;

FIG. 5A-5E shows several exemplary process steps for manufacturing adevice according to various embodiments; and

FIG. 6 shows a conventional vertical DMOS-FET.

DETAILED DESCRIPTION

FIG. 1 shows a cross-sectional view of a vertical DMOS-FET according tovarious embodiments. A highly doped N+substrate 115 is provided on topof which an N− epitaxial layer 110 has been grown. From the top into theepitaxial layer 110 there are formed N+ doped left and right sourceregions 130 each surrounded by a P-doped region 120 which forms theP-base. A heavier doped P+ region 135 can be implanted within the P-base120 for connection to the source terminal. Each P-base 120 mayadditionally be surrounded by an associated out diffusion area 125 asindicated by the dotted line. Other structures for the left and rightsource regions 130 may be used. Similar as for the transistor shown inFIG. 6, a source contact 160 generally contacts both regions 130 and 120on the surface of the die and is generally formed by a metal layer thatconnects both left and right source region. An insulating structure 140is used to insulate a left and right gates 152, 154. According to anembodiment, this structure 140 comprises a gate oxide layer 142 underpolysilicon gate 152, 154 of the transistor as indicated by thedash-dotted line. This gate oxide layer 142 can be formed using adeposited oxide which is followed up by a thermal oxidation whichdensifies the deposited oxide 142 making it more robust.

Contrary to the conventional vertical DMOS-FET, the insulating structure140 comprises a further thick insulating layer 145 which is depositedand masked on this gate oxide layer 140 which covers the central spacebetween the right and left P-bases 120. According to an embodiment, thisthick oxide 145 is deposited before the contacts to source 130/135 arecut. This further insulating layer 145 can be the inter-metal dielectric(IMD) which also helps to separate the metal contacts from the Gateelectrode. Here, the thick insulating layer 145 is masked and etched toform a left and right step on layer 142 and therefore a pedestal area inthe center as will be explained in more detail below. The right and leftgate 152, 154 is then formed by polysilicon on the right and left thinportions of the insulating layer 142 along the side walls of thepedestal section 145 of insulating structure 140. Right and left gates152 and 154 each cover a part of the respective left and right P-baseregion 120. Hence, left and right channels can be formed within theP-base regions 120 with appropriate voltages applied to the gate andsource contacts. The gates 152 and 154 are interconnected by a bridgingarea 156 on top of the pedestal 145. The pedestal 145 is thick enough toavoid a significant contribution of the bridging area to the gatecapacitance. Thus, according to various embodiments, the cell proposedstructure does not only create two source regions 120, 130, 135 and twochannels but also two polysilicon gates 152 and 154. According tofurther embodiments, a lightly doped area 190 may be provided in thecenter section between the left and right P-base regions which extendsfrom the top surface into the epitaxial layer 110 as shown by the brokenline in FIG. 1. The bottom side of this vertical transistor has againanother metal layer 105 forming the drain contact 180.

The small footprint of the narrow gates 152, 154 provides for very smallgate capacitances. Hence, the resulting individual gate-source andgate-drain capacitances are effectively in sum much smaller than therespective gate capacitances of a conventional vertical DMOS-FET as forexample shown in FIG. 6. The various embodiments, thus, effectivelyprovide for two trench gates 152, 154 wherein the bridging area 156 isspaced apart from the epitaxial layer 110 to only contributeinsignificantly with respect to the gate capacitances. As will beexplained below in more detail, the bridging area 156 may also beomitted entirely or arranged outside the cell area.

FIG. 2 shows another embodiment. The general structure of the powertransistor cell can be identical to the embodiment shown in FIG. 1. Inaddition a sinker structure 210, for example a polysilicon sinker, canbe formed in the center of the region between the left and right P-baseregions 120 extending from the top surface of the epitaxial layer 110 tothe substrate 115. The sinker implant 210 is used to provide a lowresistance path for the current to flow when the device is in fulloperation. It also helps in reducing the Rdson for the device since itwill effectively reduce the resistance of the N− epitaxial film 110locally.

FIG. 3 shows the cell of FIG. 2 after a metal layer 310 has been formed.Metal layer 310 provides for an electrical connection of the sourceregion 130 and neighboring contact zone 140 effectively connecting theP-base 120 and the source. The metal layer 310 also connects left andright source regions 130, 140 as well as source regions of furthercells.

FIG. 4A shows a the narrow trench gate 154 which is surrounded by thethick insulating layer 145 and sits on top of gate oxide layer 142.According to another embodiment as shown in FIG. 4B, a single gate oxidelayer 140 is deposited and trench 158 is formed within this layer 140.

FIG. 5A-5E show exemplary process steps for manufacturing a device asshown in FIG. 1. However, according to the applied technology othersteps may be suitable to produce a similar device. As shown in FIG. 5A,an N− doped epitaxial layer 110 is grown on a heavily doped N+ substrate115. On top of the epitaxial layer 110 an oxide layer 142, such assilicondioxide or any other appropriate gate oxide layer is deposited.This gate oxide layer 142 can be formed using a deposited oxide which isfollowed up by a thermal oxidation which densifies the deposited oxidemaking it more robust. As shown in FIG. 5B, a thick insulating oxidelayer 145 such as an inter-metal dielectric layer is then deposited onthe gate oxide 142. The thick insulating layer 145 can be patterned asshown in FIGS. 5B and P-doped base regions 120 can be formed in theepitaxial layer 110 with well known diffusion techniques. The P-baseregions are then covered again with thick oxide layer 145 and narrowtrenches 510 are formed within the thick oxide layer 145 as shown inFIG. 5C. A polysilicon layer can then be deposited on top of the layerand can be patterned by appropriate masking and etching techniques toform the gate structure having a reversed U-shape as shown in FIG. 5D.This gate structure 150 can then be used as a mask to cut out the metalconnection vias for metal layer 131 connecting the left and right sourceregions 130, 135. Thus, the cell structure can be self aligned.Furthermore, FIG. 5E shows the cell after metal layer 131 contacting thesources and back metal layer 105 contacting the drain region 115 havebeen deposited.

According to an embodiment, the step of patterning the gate insulatingstructure 140 to form gate structure 150 may also be performed in onesingle step. Thus, no additional process step is required. However,according to other embodiments, more than one step may be used forexample when providing for the trench gate structure shown in FIG. 4A orif the bridging are 156 is partially removed to connect the gates 152and 154 outside the cell structure area.

The cell structure can be a stripe structure as shown in FIG. 1-3.However, according to other embodiments may use square cells, hexagonalshapes or any other suitable cell shape for which the principle of thevarious embodiments can be applied to. The cell structure or a pluralityof cells can be used to form a power DMOS-FET within an integratedcircuit or in a discrete transistor device. Such an integrated circuitmay provide control circuits for use in a switched mode power supply.Thus, no external power transistors may be necessary.

Furthermore, the exemplary embodiment shows a P-channel device withappropriate conductivity type of the different regions. A person skilledin the art will appreciate that the embodiments of the presentapplication are not restricted to P-channel devices but can be alsoapplied to N-Channel devices

1. A vertical diffused metal oxide semiconductor (DMOS) field-effecttransistors (FET), with a cell structure comprising: a substrate of afirst conductivity type forming a drain region; an epitaxial layer ofthe first conductivity type on said substrate; first and second baseregions of the second conductivity type within said epitaxial layer,spaced apart by a predefined distance; first and second source regionsof a first conductivity type arranged in said first and second baseregions, respectively, wherein said first and second base region isoperable to form first and second lateral channels between said sourceregion and said epitaxial layer; a gate structure insulated from saidepitaxial layer by an insulation layer and arranged above the regionbetween the first and second base regions and wherein the gate structurecomprises first and second gate regions, each gate region only coveringthe first and second channel, respectively within said first and secondbase region.
 2. The vertical DMOS-FET according to claim 1, wherein theinsulating layer comprises a gate oxide layer on top of which a thickoxide layer is deposited and patterned.
 3. The vertical DMOS-FETaccording to claim 2, wherein the thick oxide layer is patterned to forma pedestal between said first and second source regions.
 4. The verticalDMOS-FET according to claim 1, further comprising a lightly doped areaof the second conductivity type extending from the surface into theepitaxial layer between the first and second base regions.
 5. Thevertical DMOS-FET according to claim 1, further comprising a sinkerextending from the surface into the epitaxial layer between the firstand second base regions.
 6. The vertical DMOS-FET according to claim 1,further comprising a source metal layer connecting said first and secondsource region and said first and second base region.
 7. The verticalDMOS-FET according to claim 1, further comprising first and seconddiffusion areas of said second conductivity type surrounding said firstand second base regions, respectively.
 8. The vertical DMOS-FETaccording to claim 1, wherein the gate structure comprises a bridgingsection connecting the first and second gate and being farther spacedapart from said epitaxial layer than said first and second gate.
 9. Thevertical DMOS-FET according to claim 8, wherein the bridging area isarranged outside the cell structure.
 10. The vertical DMOS-FET accordingto claim 1, wherein the first and second gate are connected by wirebonding.
 11. The vertical DMOS-FET according to claim 1, furthercomprising a drain metal layer on the backside of the substrate.
 12. Thevertical DMOS-FET according to claim 1, wherein the cell structure or aplurality of cell structures are formed in an integrated circuit device.13. The vertical DMOS-FET according to claim 12, wherein the integratedcircuit device provides for control functions for a switched mode powersupply.
 14. The vertical DMOS-FET according to claim 1, wherein thefirst conductivity type is P-type and the second conductivity type isN-type.
 15. The vertical DMOS-FET according to claim 1, wherein thefirst conductivity type is N-type and the second conductivity type isP-type.
 16. A method for manufacturing a cell structure of a verticaldiffused metal oxide semiconductor (DMOS) field-effect transistors(FET), comprising: forming a cell structure comprising first and secondsource regions of a first conductivity type within a first and secondbase region of a second conductivity type in an epitaxial layer of afirst conductivity type arranged on a substrate of a first conductivitytype, wherein the first and second base regions are spaced apart by apredefined distance, and wherein said first and second base region isoperable to form first and second lateral channels between said sourceregion and said epitaxial layer; forming a gate insulating layer on topof said epitaxial layer having a pedestal between said first and secondbase region; forming first and second gates on side walls of saidpedestal covering said first and second channel.
 17. The methodaccording to claim 16, wherein the step of forming a gate insulatinglayer comprises: depositing a thin gate oxide layer, depositing a thickoxide layer on top the thin gate oxide layer, and etching the thickoxide layer to form said pedestal.
 18. The method according to claim 16,further comprising forming a lightly doped region extending from thesurface of the epitaxial layer into the epitaxial layer between saidfirst and second base region.
 19. The method according to claim 16,wherein the step of forming the first and second gate provides for abridging area of a gate structure connecting the first and second gates.20. The method according to claim 19, wherein the bridging area islocated outside the cell structure.
 21. The method according to claim16, further comprising connecting the first and second gates by a metallayer.
 22. The method according to claim 16, further comprisingconnecting the first and second gates by wire bonding.
 23. The methodaccording to claim 16, further comprising forming a sinker structure inthe center area between said first and second base regions extendingfrom the surface of the expitaxial layer to the substrate.